- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/72 - Repair or correction of mask defects
Patent holdings for IPC class G03F 1/72
Total number of patents in this class: 227
10-year publication summary
|
24
|
21
|
28
|
26
|
17
|
17
|
20
|
16
|
14
|
7
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
42 |
| Carl Zeiss SMT GmbH | 2646 |
38 |
| Carl Zeiss SMS Ltd. | 44 |
21 |
| ASML Netherlands B.V. | 6816 |
11 |
| Samsung Electronics Co., Ltd. | 131630 |
10 |
| Kioxia Corporation | 9847 |
10 |
| Intel Corporation | 45621 |
6 |
| Dai Nippon Printing Co., Ltd. | 3891 |
6 |
| KLA Corporation | 1223 |
6 |
| Applied Materials, Inc. | 16587 |
5 |
| Hoya Corporation | 2822 |
4 |
| Changxin Memory Technologies, Inc. | 4732 |
4 |
| Siemens Industry Software Inc. | 1633 |
4 |
| United Microelectronics Corp. | 3921 |
3 |
| Photronics, Inc. | 47 |
3 |
| Toppan Printing Co., Ltd. | 2212 |
3 |
| Agc, Inc. | 4029 |
3 |
| Hitachi High-Tech Science Corporation | 326 |
2 |
| SK Hynix Inc. | 11030 |
2 |
| Synopsys, Inc. | 2829 |
2 |
| Other owners | 42 |